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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science

Siegfried Hofmann

Springer-Verlag Berlin and Heidelberg GmbH Co. K
2012
sidottu
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science

Siegfried Hofmann

Springer-Verlag Berlin and Heidelberg GmbH Co. K
2014
nidottu
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Auger Spectroscopy and Electronic Structure

Auger Spectroscopy and Electronic Structure

Springer-Verlag Berlin and Heidelberg GmbH Co. K
2011
nidottu
This first International Workshop on Auger Spectroscopy and Electronic Struc­ ture - IWASES 1, held in Giardini-Naxos, Sicily, Italy, grew out of a number of longstanding collaborations between the various Institutes of Physics of the University of Messina, namely the Institute of the Structure of Matter, the In­ stitute of Theoretical Physics and the Institute of General Physics, and groups in other European countries at the University of Liverpool, England, the Insti­ tute of Physical Chemistry, University of Munich, and the Fritz Haber Institute of the Max Planck Society, Berlin, FRG. This workshop was the first to be devoted solely to Auger electron spectroscopy. This initiative was motivated by the enormous evolution of the field within the last decade to a point where it now extends far beyond the mere application of this spectroscopy as an analytical tool to determine surface cleanliness and surface composition. In fact, the Auger process, which is a multi-electron process, and which leaves the sample in a doubly (or higher) ionized state, is an invaluable probe for investigating excited states and, in particular, electron (or hole) correlation effects. These correlation effects play an important role for many physical prop­ erties of matter such as magnetism, screening processes, and electron stimulated desorption (ESD), to name but a few.
August Strindberg im Lichte Seiner Selbstbiographie

August Strindberg im Lichte Seiner Selbstbiographie

Alfred Storch

Springer-Verlag Berlin and Heidelberg GmbH Co. K
1921
nidottu
Dieser Buchtitel ist Teil des Digitalisierungsprojekts Springer Book Archives mit Publikationen, die seit den Anfängen des Verlags von 1842 erschienen sind. Der Verlag stellt mit diesem Archiv Quellen für die historische wie auch die disziplingeschichtliche Forschung zur Verfügung, die jeweils im historischen Kontext betrachtet werden müssen. Dieser Titel erschien in der Zeit vor 1945 und wird daher in seiner zeittypischen politisch-ideologischen Ausrichtung vom Verlag nicht beworben.
August Wilhelm Ifflands Briefwechsel

August Wilhelm Ifflands Briefwechsel

Springer-Verlag Berlin and Heidelberg GmbH Co. KG
2025
sidottu
August Wilhelm Iffland legte die Korrespondenz, die er als Direktor des Berliner Nationaltheaters von 1796 bis 1814 führte, geordnet ab und etablierte so ein administratives und dramaturgisches Archiv, das zu einem wichtigen Arbeitsinstrument seiner Theaterleitung wurde. Dieses Archiv eignet sich in besonderer Weise dafür, Einblicke in die komplexen Entstehungsprozesse von Theateraufführungen zu eröffnen. Eine Theateraufführung entsteht durch die Interaktion verschiedener Elemente: institutioneller Rahmen, Raum, Darsteller, Publikum, Bühnenspiel, Text, Musik, Tanz, Kostüme, Dekorationen, Requisiten, Beleuchtung. Mit der vorliegenden Briefauswahl und den einführenden Texten wird der Versuch unternommen, diese Elemente sichtbar zu machen.
Auguste Caroline Sophie Herzogin von Sachsen-Coburg-Saalfeld geborene Reuß-Ebersdorf
Auguste Caroline Sophie wurde 1757 in Ebersdorf geboren. Dort regierte ihr Vater Graf Heinrich 24. Reu zu Ebersdorf einen der kleinsten deutschen Kleinstaaten. Trotzdem wurde Auguste zu einer der einflussreichsten Frauen ihrer Zeit und zur "Stammmutter des europ ischen Hochadels". Sie heiratete den Erbprinzen Franz Friedrich Anton von Sachsen-Coburg-Saalfeld und reiste 1795 auf Einladung von Zarin Katharina II. mit ihren drei ltesten T chtern nach St. Petersburg. Katharinas Enkel Konstantin heiratete Augustes Tochter Juliane. F r das kleine mitteldeutsche Herzogtum Coburg war diese Verbindung mit dem m chtigen Zarenreich der erste entscheidende Schritt zu einem Land von europ ischer Bedeutung. Auch die anderen Kinder Augustes und deren Nachkommen profitierten davon, schlossen vorteilhafte Ehen und gelangten in einflussreiche Positionen. So waren die fr heren K nige von Portugal und die Zaren von Bulgarien direkte Nachkommen von Auguste, ebenso wie der letzte deutsche Kaiser. Und auch die heute noch bestehenden K nigsh user von England und Belgien lassen sich in direkter Linie auf Auguste, geb. Reu -Ebersdorf, zur ckf hren.