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Kirjailija

David Z. Pan

Kirjat ja teokset yhdessä paikassa: 4 kirjaa, julkaisuja vuosilta 2015-2021, suosituimpien joukossa Design for Manufacturability with Advanced Lithography. Vertaile teosten hintoja ja tarkista saatavuus suomalaisista kirjakaupoista.

4 kirjaa

Kirjojen julkaisuhaarukka 2015-2021.

A Synergistic Framework for Hardware IP Privacy and Integrity Protection

A Synergistic Framework for Hardware IP Privacy and Integrity Protection

Meng Li; David Z. Pan

Springer Nature Switzerland AG
2021
nidottu
This book proposes a synergistic framework to help IP vendors to protect hardware IP privacy and integrity from design, optimization, and evaluation perspectives. The proposed framework consists of five interacting components that directly target at the primary IP violations. All the five algorithms are developed based on rigorous mathematical modeling for primary IP violations and focus on different stages of IC design, which can be combined to provide a formal security guarantee.
A Synergistic Framework for Hardware IP Privacy and Integrity Protection

A Synergistic Framework for Hardware IP Privacy and Integrity Protection

Meng Li; David Z. Pan

Springer Nature Switzerland AG
2020
sidottu
This book proposes a synergistic framework to help IP vendors to protect hardware IP privacy and integrity from design, optimization, and evaluation perspectives. The proposed framework consists of five interacting components that directly target at the primary IP violations. All the five algorithms are developed based on rigorous mathematical modeling for primary IP violations and focus on different stages of IC design, which can be combined to provide a formal security guarantee.
Design for Manufacturability with Advanced Lithography

Design for Manufacturability with Advanced Lithography

Bei Yu; David Z. Pan

Springer International Publishing AG
2016
nidottu
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
Design for Manufacturability with Advanced Lithography

Design for Manufacturability with Advanced Lithography

Bei Yu; David Z. Pan

Springer International Publishing AG
2015
sidottu
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.